Chemically amplified positive resist composition and resist pattern forming process
US-12164231-B2 · Dec 10, 2024 · US
Resist composition, method of forming resist pattern, novel compound and acid generator
US9017919B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9017919-B2 |
| Application number | US-201113282920-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 27, 2011 |
| Priority date | Oct 29, 2010 |
| Publication date | Apr 28, 2015 |
| Grant date | Apr 28, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) having a group represented by general formula (b1-1) shown below in the cation moiety.
First claim
Opening claim text (preview).
What is claimed is: 1. A resist composition, comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) comprises an acid generator (B1) having a group represented by general formula (b1-2) shown below: w…
Assignees
Inventors
Classifications
Cross-Sectional Technologies · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Physics · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9017919B2 cover?
- A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) having a group represented by general formula (b1-1) shown below in the cation moiety.
- Who is the assignee on this patent?
- Utsumi Yoshiyuki, Kawaue Akiya, Komuro Yoshitaka, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0045. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Apr 28 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).