Polymerizable compound having triple bond, liquid crystal composition and liquid crystal display device
US-2015376505-A1 · Dec 31, 2015 · US
Monomer, polymer, chemically amplified positive resist composition, and patterning process
US9017918B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9017918-B2 |
| Application number | US-201113150698-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 1, 2011 |
| Priority date | Jun 1, 2010 |
| Publication date | Apr 28, 2015 |
| Grant date | Apr 28, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.
First claim
Opening claim text (preview).
The invention claimed is: 1. A polymer having a weight average molecular weight of 1,000 to 500,000, and comprising recurring units (a) having the general formula (2): wherein R l is hydrogen or methyl, R 2 is hydrogen or C 1 -C 4 alkyl, R 3 is an acid labile group, m is an integer of 1 to 4, and a is a positive number from more than 0 to 1.0, and recurring units (b) having…
Assignees
Inventors
Classifications
Chemistry & Metallurgy · mapped topic
Physics · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Physics · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9017918B2 cover?
- A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and goo…
- Who is the assignee on this patent?
- Hatakeyama Jun, Tachibana Seiichiro, Hasegawa Koji, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification C08F214/18. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Apr 28 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).