Apparatus and method for treating a substrate with solid particles
US-12091801-B2 · Sep 17, 2024 · US
Cleaning method
US9017423B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9017423-B2 |
| Application number | US-201414163170-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 24, 2014 |
| Priority date | Apr 7, 2006 |
| Publication date | Apr 28, 2015 |
| Grant date | Apr 28, 2015 |
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Abstract
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The invention provides a method and formulation for cleaning a soiled substrate, the method comprising the treatment of the moistened substrate with a formulation comprising a multiplicity of polymeric particles, wherein the formulation is free of organic solvents. Preferably, the substrate is wetted so as to achieve a substrate to water ratio of between 1:0.1 to 1:5 w/w. Optionally, the formulation additionally comprises at least one cleaning material and, in this embodiment, it is preferred that the polymeric particles are coated with the at least one cleaning material. Preferably, the cleaning material comprises a surfactant, which most preferably has detergent properties. Most preferably, the substrate comprises a textile fiber. Typically, the polymeric particles comprise particles of nylon, most preferably in the form of nylon chips. The results obtained are very much in line with those observed when carrying out conventional dry cleaning processes and the method provides the significant advantage that the use of solvents, with all the attendant drawbacks in terms of cost and environmental considerations, can be avoided.
First claim
Opening claim text (preview).
That which is claimed is: 1. A method for cleaning a soiled substrate, said method comprising treating of the soiled substrate with water to provide a premoistened soiled substrate and treating the premoistened soiled substrate with a formulation comprising a multiplicity of polymeric particles, wherein said formulation is free of organic solvents, wherein said formulation comprises at least one cleaning material selected from anionic, cationic and non-ionic surfactants, wherein sa…
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Classifications
- D06F35/006Primary
Textiles & Paper · mapped topic
Chemistry & Metallurgy · mapped topic
- D06L1/01Primary
Textiles & Paper · mapped topic
- C11D3/3719Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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Frequently asked questions
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- What does patent US9017423B2 cover?
- The invention provides a method and formulation for cleaning a soiled substrate, the method comprising the treatment of the moistened substrate with a formulation comprising a multiplicity of polymeric particles, wherein the formulation is free of organic solvents. Preferably, the substrate is wetted so as to achieve a substrate to water ratio of between 1:0.1 to 1:5 w/w. Optionally, the formul…
- Who is the assignee on this patent?
- Xeros Ltd
- What technology area does this patent fall under?
- Primary CPC classification D06F35/006. Mapped technology areas include Textiles & Paper.
- When was this patent published?
- Publication date Tue Apr 28 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).