Security element having a microstructure

Patent metadata

Field	Value
Publication number	US-9016726-B2
Application number	US-201013510714-A
Country	US
Kind code	B2
Filing date	Nov 15, 2010
Priority date	Nov 19, 2009
Publication date	Apr 28, 2015
Grant date	Apr 28, 2015

Abstract

The invention relates to a security element for security papers, value documents and the like with at least one microstructure which has a visual appearance that is viewing angle-dependent in transmission, whereby the at least one microstructure is formed from an arrangement of a multiplicity of structure elements with a characteristic structure spacing of 1 μm or more. According to the invention it is provided that the security element contains at least one motif image which, through the viewing angle-dependent visual appearance of the microstructure, is visible in transmission from certain viewing angles, and invisible in transmission from other viewing angles, and that the microstructure and the motif image together have a thickness of 50 μm or less.

First claim

The invention claimed is:

1. A security element comprising:
at least one microstructure which has a visual appearance that is viewing angle-dependent in transmission, and wherein the at least one microstructure is formed from an arrangement of a multiplicity of structure elements with a characteristic structure spacing of 1 μm or more,
said security element containing at least one motif image which, through the viewing angle-dependent visual appearance of the microstructure, is visible in transmission from certain viewing angles, and invisible in transmission from other viewing angles, the security element includes an embossing lacquer layer and the structure elements are embossed into the lacquer layer, the structure elements are provided in partial regions with an opaque coating, and wherein the microstructure is permanently arranged on the motif image and the microstructure and the motif image together have a thickness of 50 μm or less.

2. The security element according to claim 1 , wherein at least one microstructure of the security element comprises a lamella structure having a multiplicity of substantially parallel extending lamellae.

3. The security element according to claim 2 , wherein at least one lamella structure is formed by a partly metallized asymmetric sawtooth structure with metallized first, less strongly inclined flanks and with non-metallized second, more strongly inclined flanks.

4. The security element according to claim 3 , wherein the first, less strongly inclined flanks have an angle of inclination between 10° and 60° and the second, more strongly inclined flanks an angle of inclination between 50° and 110°, wherein the two angles of inclination differ by at least 20°.

5. The security element according to claim 1 , comprising a plurality of microstructures comprising lamella structures which differ in one or several of the parameters of lateral orientation, color, width, height, relief form and spacing, and wherein the differing lamella structures are arranged in the form of a motif.

6. The security element according to claim 5 , wherein the differing lamella structures are arranged in the form of a motif, wherein the motif of the lamella structures and at least one motif image of the security element complement each other to form a total information item in transmission from certain viewing angles.

7. The security element according to claim 1 , wherein the structure elements are provided in partial regions with an opaque coating.

8. The security element according to claim 7 , wherein the opaque coating is configured to be multi-layer.

9. The security element according to claim 7 , wherein the opaque coating is configured as a thin-film element with a color-shift effect.

10. The security element according to claim 1 , wherein the security element has a transparent or translucent substrate, and the at least one microstructure and the motif image are arranged on opposing surfaces of the substrate.

11. The security element according to claim 1 , wherein the security element comprises a transparent, translucent or opaque substrate, and the at least one microstructure and the motif image arc arranged on the same surface of the substrate.

12. The security element according to claim 1 , wherein the at least one microstructure is arranged directly on the motif image.

13. The security element according to claim 1 , wherein the motif image comprises one or more of, or a combination of, a plurality of a printed or embossed motif structure, a structured metal layer, a color-shifting motif layer, a diffractive motif layer, a structured multi-layer construction, a structured subwavelength grating, a moth-eye structure, a printed structure, and a layer with negative patterns.

14. The security element according to claim 1 , wherein the security element contains a second motif image which is applied to at least one microstructure, so that only the first motif image is visible in transmission from certain viewing angles and only the second motif image from other viewing angles.

15. The security element according to claim 1 , wherein the microstructure and the motif image together have a thickness of 20 μm or less.

16. The security element according to claim 1 , wherein the structure elements have either or both a characteristic structure spacing of 5 μm or more and the structure elements have a structure size of 1 μm or more.

17. The security element according to claim 1 , wherein the structure elements are arranged substantially periodically, and the period given by the characteristic structure spacing is superimposed by a random fluctuation of the structure spacings with an amplitude between 1% and 5%.

18. The security element according to claim 1 , wherein in the motif image of the security element, a predetermined motif to be represented is distorted, and the motif image and at least one microstructure are so mutually coordinated that the motif to be represented is visible undistorted in transmission at a predetermined curvature of the security element.

19. The security element according to claim 18 , wherein the security element is a transfer element for transfer to a target substrate.

20. A method for manufacturing a security element, the method comprising the steps:
providing the security element with at least one microstructure with a visual appearance that is viewing angle-dependent in transmission;
forming the at least one microstructure from an arrangement of a multiplicity of structure elements with a characteristic structure spacing of 1 μm or more; the security element including an embossing lacquer layer and the structure elements being embossed into the lacquer layer
providing the security element with at least one motif image which is visible in transmission from certain viewing angles, and invisible in transmission from other viewing angles, wherein the microstructure is permanently arranged on the motif image; and
producing the security element with a thickness of the microstructure and the motif image together of 50 μm or less, wherein the structure elements are provided in partial regions with an opaque coating.

21. The method according to claim 20 , including forming at least one microstructure of the security element by a lamella structure comprising a multiplicity of substantially parallel extending lamellae.

22. The method according to claim 21 , wherein the step of producing at least one lamella structure is carried out by:
applying an embossing lacquer layer to a substrate,
embossing the embossing lacquer layer and hardening the embossed embossing lacquer layer in the form of a lamella structure with a multiplicity of substantially parallel extending lamellae,
coating the lamella structure with a metallization over the full area,
etching the metallization by an etching operation, and
ending the etching step as soon as the metallization present on the lamellae is reduced to a preselected layer thickness appearing transparent, or is completely etched through.

23. The method according to claim 22 , wherein the etching methods used are physical etching methods, ion etching, ion beam etching, reactive plasma etching or atmospheric plasma etching, or chemical etching methods employing acids or bases.

24. The method according to claim 21 , wherein at least one lamella structure is formed by a partly metallized asymmetric sawtooth structure, and
wherein a coating of the sawtooth structure is effected by chemic

Assignees

• Rauch Andreas
• Rahm Michael
• Heim Manfred
• Fuhse Christian
• Giesecke & Devrient Gmbh

Inventors

• Rauch Andreas
• Rahm Michael
• Heim Manfred
• Fuhse Christian

Classifications

• B42D25/373

  Metallic materials · CPC title

• B42D25/29 Primary

  Securities; Bank notes · CPC title

• B42D25/36

  comprising special materials · CPC title

• B42D25/351

  Translucent or partly translucent parts, e.g. windows · CPC title

• B42D25/324 Primary

  Reliefs · CPC title