Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography

US9013676B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9013676-B2
Application numberUS-201113172448-A
CountryUS
Kind codeB2
Filing dateJun 29, 2011
Priority dateJan 9, 2009
Publication dateApr 21, 2015
Grant dateApr 21, 2015

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  5. First independent claim

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Abstract

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An individual mirror is used to construct a facet mirror. A mirror body of the individual mirror is configured to be tiltable relative to a rigid carrier body about at least one tilting axis of a tilting joint. The tilting joint is configured as a solid-body joint. The solid-body joint, perpendicular to the tilting axis, has a joint thickness S and, along the tilting axis, a joint length L. The following applies: L/S>50. The result is an individual mirror to construct a facet mirror, which can be reproduced and is precisely adjustable and simultaneously ensures adequate heat removal, in particular, heat produced by residually absorbed useful radiation, which is reflected by the individual mirror, by dissipation of the heat by the mirror body.

First claim

Opening claim text (preview).

What is claimed is: 1. A system, comprising: a mirror configured to be used in a microlithography facet mirror, the mirror comprising: a rigid carrier body; and a mirror body configured to be tiltable relative to the rigid carrier body about a tilting axis; and an actuator configured to control tilting of the mirror body about the tilting axis, the actuator comprising: a first joint body; a second joint body; a movement electrode movably connected to the first joint bo…

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What does patent US9013676B2 cover?
An individual mirror is used to construct a facet mirror. A mirror body of the individual mirror is configured to be tiltable relative to a rigid carrier body about at least one tilting axis of a tilting joint. The tilting joint is configured as a solid-body joint. The solid-body joint, perpendicular to the tilting axis, has a joint thickness S and, along the tilting axis, a joint length L. The…
Who is the assignee on this patent?
Werber Armin, Muehlberger Norbert, Bach Florian, and 1 more
What technology area does this patent fall under?
Primary CPC classification G02B26/0841. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 21 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).