Method and device for liquid crystal optical alignment

US9013659B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9013659-B2
Application numberUS-201213576396-A
CountryUS
Kind codeB2
Filing dateJun 27, 2012
Priority dateJun 21, 2012
Publication dateApr 21, 2015
Grant dateApr 21, 2015

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Abstract

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The present invention provides a method for liquid crystal alignment, which includes: providing a substrate, the substrate being disposed with a liquid crystal layer; using a first radiation beam and a second radiation beam to radiate the substrate, the first radiation beam being for performing alignment on liquid crystal layer and the second beam being for adjusting substrate temperature. The method and device for liquid crystal alignment of the present invention can rapidly adjust environment temperature during liquid crystal alignment and achieve optimization of reaction speed and uniformity through temperature control during polymerization. The present invention is simple in structure, easy to operate and low cost.

First claim

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What is claimed is: 1. A method for liquid crystal alignment, which comprises: providing a substrate, the substrate being disposed with a liquid crystal layer; using at least one first radiation beam and at least one second radiation beam to radiate the substrate, the at least one first radiation beam being for performing alignment on liquid crystal layer and the at least one second beam being for adjusting substrate temperature; and wherein the at least one first radiation so…

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What does patent US9013659B2 cover?
The present invention provides a method for liquid crystal alignment, which includes: providing a substrate, the substrate being disposed with a liquid crystal layer; using a first radiation beam and a second radiation beam to radiate the substrate, the first radiation beam being for performing alignment on liquid crystal layer and the second beam being for adjusting substrate temperature. The …
Who is the assignee on this patent?
Chiu Chung-Yi, Shenzhen China Star Optoelect
What technology area does this patent fall under?
Primary CPC classification G02F1/133788. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 21 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).