N-type gallium-nitride layer having multiple conductive intervening layers

US9012939B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9012939-B2
Application numberUS-201113196828-A
CountryUS
Kind codeB2
Filing dateAug 2, 2011
Priority dateAug 2, 2011
Publication dateApr 21, 2015
Grant dateApr 21, 2015

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Abstract

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A vertical GaN-based blue LED has an n-type layer comprising multiple conductive intervening layers. The n-type layer contains a plurality of periods. Each period of the n-type layer includes a gallium-nitride (GaN) sublayer and a thin conductive aluminum-gallium-nitride (AlGaN:Si) intervening sublayer. In one example, each GaN sublayer has a thickness substantially more than 100 nm and less than 1000 nm, and each AlGaN:Si intervening sublayer has a thickness less than 25 nm. The entire n-type layer is at least 2000 nm thick. The AlGaN:Si intervening layer provides compressive strain to the GaN sublayer thereby preventing cracking. After the epitaxial layers of the LED are formed, a conductive carrier is wafer bonded to the structure. The silicon substrate is then removed. Electrodes are added and the structure is singulated to form a finished LED device. Because the AlGaN:Si sublayers are conductive, the entire n-type layer can remain as part of the finished LED device.

First claim

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What is claimed is: 1. A Light Emitting Diode (LED) device for emitting non-monochromatic light, the LED device comprising: an n-type layer that comprises a plurality of periods including a plurality of gallium-nitride (GaN) sublayers and a plurality of aluminum-gallium-nitride doped with silicon (AlGaN:Si) intervening sublayers, each of the AlGaN:Si intervening sublayers sandwiched by the gallium-nitride (GaN) sublayers, the gallium-nitride (GaN) sublayers located at top and bott…

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What does patent US9012939B2 cover?
A vertical GaN-based blue LED has an n-type layer comprising multiple conductive intervening layers. The n-type layer contains a plurality of periods. Each period of the n-type layer includes a gallium-nitride (GaN) sublayer and a thin conductive aluminum-gallium-nitride (AlGaN:Si) intervening sublayer. In one example, each GaN sublayer has a thickness substantially more than 100 nm and less th…
Who is the assignee on this patent?
Chen Zhen, Fu Yi, Toshiba Kk
What technology area does this patent fall under?
Primary CPC classification H10H20/825. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 21 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).