Conductive structure body precursor, conductive structure body and method for manufacturing the same
US-2015370359-A1 · Dec 24, 2015 · US
US9012876B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9012876-B2 |
| Application number | US-201013637018-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 21, 2010 |
| Priority date | Mar 26, 2010 |
| Publication date | Apr 21, 2015 |
| Grant date | Apr 21, 2015 |
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Germanium antimony telluride materials are described, e.g., material of the formula Ge x Sb y Te z C m N n , wherein x is about 0.1-0.6, y is about 0-0.7, z is about 0.2-0.9, m is about 0.02-0.20, and n is about 0.2-0.20. One specific composition includes from 0 to 50% Sb, from 50 to 80% Te, from 20 to 50% Ge, from 3 to 20% N and from 2 to 15% carbon, wherein all atomic percentages of all components of the film total to 100 atomic %. Another specific composition includes from 10 to 50% Sb, from 50 to 80% Te, from 10 to 50% Ge, from 3 to 20% N and from 3 to 20% carbon, and wherein all atomic percentages of all components of the film total to 100 atomic %. Material of such composition is useful to form phase change films, e.g., as conformally coated on a phase change memory device substrate to fabricate a phase change random access memory cell.
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What is claimed is: 1. A chalcogenide germanium-antimony-tellurium material doped with carbon and nitrogen, wherein the amount of tellurium is greater than 50 at. %, wherein carbon is doped in said material at 2-20 at. %, and wherein nitrogen is doped in said material at 2-20 at. %. 2. A material according to claim 1 , wherein the amount of tellurium is at least an amount selected from the group consisting of: 55 at. % tellurium; 54.5% tellurium; 53.9% tel…
Chemistry & Metallurgy · mapped topic
Electricity · mapped topic
Chemistry & Metallurgy · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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