Method and apparatus for treatment of self-assemblable polymer layers for use in lithography

US9011978B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9011978-B2
Application numberUS-201113580356-A
CountryUS
Kind codeB2
Filing dateJan 6, 2011
Priority dateFeb 26, 2010
Publication dateApr 21, 2015
Grant dateApr 21, 2015

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Abstract

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Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone.

First claim

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The invention claimed is: 1. A method for treatment of a layer comprising self-assemblable polymer self-assembled at a surface of a substrate, the method comprising arranging for a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone and a temperature within the zone exceeds an order-disorder transition temperature To/d of the self-assemblable polymer.…

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What does patent US9011978B2 cover?
Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone.
Who is the assignee on this patent?
Koole Roelof, Banine Vadim Yevgenyevich, Wuister Sander Frederik, and 2 more
What technology area does this patent fall under?
Primary CPC classification G03F7/0002. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 21 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).