Holding device, method of determining attraction abnormality in holding device, lithography apparatus, and method of manufacturing article
US-2024393682-A1 · Nov 28, 2024 · US
US9011978B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9011978-B2 |
| Application number | US-201113580356-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 6, 2011 |
| Priority date | Feb 26, 2010 |
| Publication date | Apr 21, 2015 |
| Grant date | Apr 21, 2015 |
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Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone.
Opening claim text (preview).
The invention claimed is: 1. A method for treatment of a layer comprising self-assemblable polymer self-assembled at a surface of a substrate, the method comprising arranging for a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone and a temperature within the zone exceeds an order-disorder transition temperature To/d of the self-assemblable polymer.…
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