Method of coating surface of inorganic powder particles with silicon-carbon composite and inorganic powder particles coated by the same
US-9221025-B2 · Dec 29, 2015 · US
Chemical vapour deposition system and process
US9011600B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9011600-B2 |
| Application number | US-201013148942-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 12, 2010 |
| Priority date | Feb 12, 2009 |
| Publication date | Apr 21, 2015 |
| Grant date | Apr 21, 2015 |
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Abstract
Official abstract text for this publication.
A chemical vapour deposition system, including: a process tube for receiving at least one sample, the process tube being constructed of silicon carbide, impregnated with silicon, and coated with silicon carbide; a pumping system to evacuate the process tube to high vacuum; one or more gas inlets for introducing one or more process gases into the evacuated process tube; and a heater to heat the process tube and thereby heat the one or more process gases and the at least one sample within the process tube to cause a material to be deposited onto the at least one sample within the process tube by chemical vapour deposition.
First claim
Opening claim text (preview).
The invention claimed is: 1. A chemical vapour deposition system, including: a process tube configured to receive at least one sample for deposition of a material thereon; a pumping system to evacuate the process tube; one or more gas inlets for introducing one or more process gases into the evacuated process tube; a heater to heat the process tube and thereby heat the one or more process gases and the at least one sample within the process tube to cause the material to be d…
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Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
- C23C16/325Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
- C23C16/46Primary
Chemistry & Metallurgy · mapped topic
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Frequently asked questions
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- What does patent US9011600B2 cover?
- A chemical vapour deposition system, including: a process tube for receiving at least one sample, the process tube being constructed of silicon carbide, impregnated with silicon, and coated with silicon carbide; a pumping system to evacuate the process tube to high vacuum; one or more gas inlets for introducing one or more process gases into the evacuated process tube; and a heater to heat the …
- Who is the assignee on this patent?
- Iacopi Alan Victor, Univ Griffith
- What technology area does this patent fall under?
- Primary CPC classification C23C16/325. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Apr 21 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).