Nanoparticle synthesis

US9000416B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9000416-B2
Application numberUS-201313744011-A
CountryUS
Kind codeB2
Filing dateJan 17, 2013
Priority dateJul 29, 2009
Publication dateApr 7, 2015
Grant dateApr 7, 2015

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A noble metal nanoparticle can be grown on a semiconductor substrate by contacting a predetermined region of the substrate with a solution including noble metal ions. The predetermined region of the semiconductor substrate can be exposed by applying a polymeric layer over the substrate selectively removing a portion of the polymeric layer. The nanoparticles can be prepared in a predetermined pattern. The nanoparticle can be formed with a barrier separating it from another nanoparticle on the substrate; for example, nanoparticle can be located in a pit etched in the substrate. The size and location of the nanoparticle can be stable at elevated temperatures.

First claim

Opening claim text (preview).

What is claimed is: 1. A composition comprising: a noble metal nanoparticle positioned on a predetermined region of a semiconductor substrate, the noble metal nanoparticle being separated from another nanoparticle on the substrate by a barrier, wherein the barrier is a portion of the semiconductor substrate that is raised relative to the region of the semiconductor substrate upon which the nanoparticle is positioned. 2. The composition of claim 1 , wherein the barrier includes a polymeric material. 3. The composition of claim 1 , wherein the barrier is raised relative to the region of the substrate upon which the nanoparticle is positioned. 4. The composition of claim 1 , wherein the substrate is GaAs. 5. The composition of claim 2 , wherein the polymeric material is PMMA. 6. The composition of claim 1 , wherein the nanoparticle is a nanocrystal. 7. The composition of claim 1 , wherein the noble metal is Au. 8. The composition of claim 1 , wherein the nanoparticle has a diameter of 25 nm or smaller, or 10 nm or smaller. 9. A nanomaterial comprising: a noble metal nanocrystal; and an amorphous layer comprising an oxide at least partially surrounding the nanoparticle. 10. The nanomaterial of claim 9 , wherein the noble metal is Au. 11. The nanomaterial of claim 9 , wherein the average diameter of the nanocrystal is 25 nm or smaller, or 10 nm or smaller. 12. The nanomaterial of claim 9 , wherein the oxide is derived from the semiconductor material.

Assignees

Inventors

Classifications

  • Nanosized particles · CPC title

  • Quantum effect devices, e.g. of devices using quantum reflection, diffraction or interference effects · CPC title

  • B22F9/24Primary

    starting from liquid metal compounds, e.g. solutions · CPC title

  • Products containing multiple oriented crystallites, e.g. columnar crystallites · CPC title

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US9000416B2 cover?
A noble metal nanoparticle can be grown on a semiconductor substrate by contacting a predetermined region of the substrate with a solution including noble metal ions. The predetermined region of the semiconductor substrate can be exposed by applying a polymeric layer over the substrate selectively removing a portion of the polymeric layer. The nanoparticles can be prepared in a predetermined pa…
Who is the assignee on this patent?
Massachusetts Inst Technology
What technology area does this patent fall under?
Primary CPC classification B22F9/24. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Apr 07 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).