Capacitively coupled electrodeless plasma apparatus and a method using capacitively coupled electrodeless plasma for processing a silicon substrate
US-2015372167-A1 · Dec 24, 2015 · US
US8999857B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8999857-B2 |
| Application number | US-201113078782-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 1, 2011 |
| Priority date | Apr 2, 2010 |
| Publication date | Apr 7, 2015 |
| Grant date | Apr 7, 2015 |
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A method for forming a nano-textured surface on a substrate is disclosed. An illustrative embodiment of the present invention comprises dispensing of a nanoparticle ink of nanoparticles and solvent onto the surface of a substrate, distributing the ink to form substantially uniform, liquid nascent layer of the ink, and enabling the solvent to evaporate from the nanoparticle ink thereby inducing the nanoparticles to assemble into an texture layer. Methods in accordance with the present invention enable rapid formation of large-area substrates having a nano-textured surface. Embodiments of the present invention are well suited for texturing substrates using high-speed, large scale, roll-to-roll coating equipment, such as that used in office product, film coating, and flexible packaging applications. Further, embodiments of the present invention are well suited for use with rigid or flexible substrates.
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What is claimed is: 1. A method for forming a textured surface on a substrate, the method comprising: providing a first material comprising nanoparticles and a first solvent; dispensing the first material on a first surface of the substrate; establishing a relative motion between the substrate and a tool that is physically separated from the substrate by a first barrier, wherein the relative motion between the tool and the substrate distributes first material substantially com…
Electricity · mapped topic
Electricity · mapped topic
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