Method for manufacturing light-emitting element inlcuding quantum dots
US-12150220-B2 · Nov 19, 2024 · US
US8999836B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8999836-B2 |
| Application number | US-38242006-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 9, 2006 |
| Priority date | May 13, 2005 |
| Publication date | Apr 7, 2015 |
| Grant date | Apr 7, 2015 |
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It is an object of the present invention to provide a technique for manufacturing a highly reliable display device at low cost with high yield. A first electrode layer is formed by a sputtering method using a gas containing hydrogen or H 2 O, an electroluminescent layer is formed over the first electrode layer, and a second electrode layer is formed over the electroluminescent layer. According to one aspect of the present invention, a display device is manufactured to include a first electrode layer including indium zinc oxide containing silicon oxide and tungsten oxide, an electroluminescent layer over the first electrode layer, and a second electrode layer over the electroluminescent layer, where the electroluminescent layer includes a layer containing an organic compound and an inorganic compound to be in contact with the first electrode layer.
Opening claim text (preview).
What is claimed is: 1. A method for manufacturing a display device, comprising the steps of: forming a thin film transistor over a substrate; forming a first insulating layer comprising a resin over the thin film transistor; forming a second insulating layer comprising a silicon nitride oxide film over and in contact with the first insulating layer; forming a titanium nitride film over and in contact with the second insulating layer; forming a reflective electrode layer ov…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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