Method for manufacturing display device

US8999836B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8999836-B2
Application numberUS-38242006-A
CountryUS
Kind codeB2
Filing dateMay 9, 2006
Priority dateMay 13, 2005
Publication dateApr 7, 2015
Grant dateApr 7, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

It is an object of the present invention to provide a technique for manufacturing a highly reliable display device at low cost with high yield. A first electrode layer is formed by a sputtering method using a gas containing hydrogen or H 2 O, an electroluminescent layer is formed over the first electrode layer, and a second electrode layer is formed over the electroluminescent layer. According to one aspect of the present invention, a display device is manufactured to include a first electrode layer including indium zinc oxide containing silicon oxide and tungsten oxide, an electroluminescent layer over the first electrode layer, and a second electrode layer over the electroluminescent layer, where the electroluminescent layer includes a layer containing an organic compound and an inorganic compound to be in contact with the first electrode layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for manufacturing a display device, comprising the steps of: forming a thin film transistor over a substrate; forming a first insulating layer comprising a resin over the thin film transistor; forming a second insulating layer comprising a silicon nitride oxide film over and in contact with the first insulating layer; forming a titanium nitride film over and in contact with the second insulating layer; forming a reflective electrode layer ov…

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What does patent US8999836B2 cover?
It is an object of the present invention to provide a technique for manufacturing a highly reliable display device at low cost with high yield. A first electrode layer is formed by a sputtering method using a gas containing hydrogen or H 2 O, an electroluminescent layer is formed over the first electrode layer, and a second electrode layer is formed over the electroluminescent layer. According …
Who is the assignee on this patent?
Oikawa Yoshiaki, Akimoto Kengo, Semiconductor Energy Lab
What technology area does this patent fall under?
Primary CPC classification H05B33/10. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 07 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).