Ion implantation system and method
US-2015357152-A1 · Dec 10, 2015 · US
Ion implant system having grid assembly
US8997688B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8997688-B2 |
| Application number | US-201213363341-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 31, 2012 |
| Priority date | Jun 23, 2009 |
| Publication date | Apr 7, 2015 |
| Grant date | Apr 7, 2015 |
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Abstract
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An ion implantation system having a grid assembly. The system includes a plasma source configured to provide plasma in a plasma region; a first grid plate having a plurality of apertures configured to allow ions from the plasma region to pass therethrough, wherein the first grid plate is configured to be biased by a power supply; a second grid plate having a plurality of apertures configured to allow the ions to pass therethrough subsequent to the ions passing through the first grid plate, wherein the second grid plate is configured to be biased by a power supply; and a substrate holder configured to support a substrate in a position where the substrate is implanted with the ions subsequent to the ions passing through the second grid plate.
First claim
Opening claim text (preview).
The invention claimed is: 1. A plasma grid implantation system comprising: a multi-stage differentially pumped system comprising: a plurality of stages, each with increasing level of vacuum leading to an implant stage having highest level of vacuum; a plurality of stages each with a decreasing level of vacuum leading away from the implant stage; a conveyor for transporting substrates to be implanted through the multi-stage differentially pumped system; a plasma implant sy…
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Electricity · mapped topic
Cross-Sectional Technologies · mapped topic
- C23C14/48Primary
Chemistry & Metallurgy · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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- What does patent US8997688B2 cover?
- An ion implantation system having a grid assembly. The system includes a plasma source configured to provide plasma in a plasma region; a first grid plate having a plurality of apertures configured to allow ions from the plasma region to pass therethrough, wherein the first grid plate is configured to be biased by a power supply; a second grid plate having a plurality of apertures configured to…
- Who is the assignee on this patent?
- Adibi Babak, Chun Moon, Intevac Inc
- What technology area does this patent fall under?
- Primary CPC classification C23C14/48. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Apr 07 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).