Apparatus for manufacturing polysilicon based electron-beam melting using dummy bar and method of manufacturing polysilicon using the same

US8997524B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8997524-B2
Application numberUS-201213464488-A
CountryUS
Kind codeB2
Filing dateMay 4, 2012
Priority dateMay 4, 2012
Publication dateApr 7, 2015
Grant dateApr 7, 2015

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Abstract

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Methods and apparatus for manufacturing high purity polysilicon. The apparatus includes a vacuum chamber; first and second electron guns disposed at an upper side of the vacuum chamber to irradiate electron beams into the vacuum chamber; a silicon melting unit which is placed on a first electron beam-irradiating region corresponding to the first electron gun and to which powdery raw silicon is fed and melted by the first electron beam; and a unidirectional solidification unit placed on a second electron beam-irradiating region corresponding to the second electron gun. The unidirectional solidification unit is provided therein with a start block driven in a downward direction to transfer molten silicon in the downward direction and is formed at a lower side thereof with a cooling channel. The start block includes a dummy bar having a silicon button joined to an upper portion of the dummy bar.

First claim

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What is claimed is: 1. A method of manufacturing polysilicon comprising: feeding powdery raw silicon to a silicon melting unit and melting the fed raw silicon by irradiating a first electron beam upon the raw silicon; continuously feeding and melting the raw silicon such that molten silicon is overflowed from the silicon melting unit; receiving, by an unidirectional solidification unit, the molten silicon overflowed from the silicon melting unit, transferring the molten silico…

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What does patent US8997524B2 cover?
Methods and apparatus for manufacturing high purity polysilicon. The apparatus includes a vacuum chamber; first and second electron guns disposed at an upper side of the vacuum chamber to irradiate electron beams into the vacuum chamber; a silicon melting unit which is placed on a first electron beam-irradiating region corresponding to the first electron gun and to which powdery raw silicon is …
Who is the assignee on this patent?
Jang Bo Yun, Lee Jin Seok, Kim Joon Soo, and 2 more
What technology area does this patent fall under?
Primary CPC classification C01B33/037. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 07 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).