Magnetic head manufacturing method forming sensor side wall film by over-etching magnetic shield
US-9196268-B2 · Nov 24, 2015 · US
US8995096B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8995096-B2 |
| Application number | US-201313844810-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 16, 2013 |
| Priority date | Mar 16, 2013 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Various embodiments may position a side shield adjacent to and separated from a stack sidewall of a magnetic stack with the side shield having a shield layer disposed between the stack sidewall and a permanent magnet. The permanent magnet can be separated from a first portion of the shield layer by a diffusion barrier that decouples the permanent magnet from the shield layer.
Opening claim text (preview).
What is claimed is: 1. An apparatus comprising a side shield positioned adjacent to and separated from a stack sidewall of a magnetic stack, the side shield comprising a shield layer disposed between the stack sidewall and a permanent magnet, the permanent magnet separated from a first portion of the shield layer by a diffusion barrier that decouples the permanent magnet from the shield layer, the permanent magnet comprising alternating metal layers that interdiffuse to a single compound in response to annealing. 2. The apparatus of claim 1 , wherein the magnetic stack is configured as an abutted junction read sensor comprising a magnetically free layer and a fixed magnetization reference structure. 3. The apparatus of claim 1 , wherein the magnetic stack is configured as a spin valve read sensor. 4. The apparatus of claim 1 , wherein the diffusion barrier comprises a non-magnetic material. 5. The apparatus of claim 1 , wherein the alternating metal layers are respectively Fe and Pt. 6. The apparatus of claim 1 , wherein the permanent magnet is decoupled from a trailing shield by a first isolation layer and the shield layer is decoupled from a leading shield and the magnetic stack by a continuous second isolation layer. 7. The apparatus of claim 6 , wherein the diffusion layer contacts the first isolation layer and is separated from the second isolation layer by the shield layer. 8. The apparatus of claim 1 , wherein the shield layer is shaped to continuously extend along two orthogonal directions to form an “L” shape. 9. The apparatus of claim 1 , wherein the permanent magnet has a higher magnetic coercivity than the shield layer. 10. The apparatus of claim 1 , wherein the shield layer has a shield sidewall shaped to match the stack sidewall. 11. An magnetic element comprising: a magnetic stack; and a side shield positioned adjacent to and separated from a stack sidewall of the magnetic stack, the side shield comprising a shield layer continuously extending along orthogonal sides of a permanent magnet, the permanent magnet separated from a first portion of the shield layer by a diffusion barrier and contacting a second portion of the shield layer, proximal the stack sidewall, the shield layer having a uniform thickness along each orthogonal side of the permanent magnet. 12. The magnetic element of claim 11 , wherein the diffusion barrier has a first width on an air bearing surface that is less than a second width of the shield layer. 13. The magnetic element of claim 11 , wherein the diffusion barrier has a uniform thickness along a cross-track direction. 14. The magnetic element of claim 11 , wherein the diffusion barrier has a varying thickness along a cross-track direction. 15. The magnetic element of claim 11 , wherein the permanent magnet and shield layer are exchange coupled along the second portion. 16. The magnetic element of claim 11 , wherein the shield layer contacts the permanent magnet at a third portion, distal the magnetic stack. 17. The magnetic element of claim 11 , wherein the diffusion barrier defines a decoupled portion between the permanent magnet and shield layer. 18. A method comprising: constructing a side shield adjacent to and separated from a stack sidewall of a magnetic stack; and separating a permanent magnet of the side shield from a shield layer of the side shield with a diffusion barrier that decouples the permanent magnet from the shield layer, the shield layer disposed between the stack sidewall and the permanent magnet and continuously extending along orthogonal sides of the permanent magnet, the diffusion barrier having a uniform thickness that separates the permanent magnet from the shield layer by a common separation distance along each orthogonal side of the permanent magnet. 19. The method of claim 18 , further comprising annealing the side shield to provide a predetermined first coercivity in the permanent magnet that is greater than a predetermined second coercivity of the shield layer. 20. The method of claim 19 , wherein the diffusion barrier prevents interdiffusion of shield layer material with permanent magnetic material during the annealing step.
Magnetic biasing films · CPC title
Fabricating head structure or component thereof · CPC title
Arrangements in which the active read-out elements are transducing in association with active magnetic shields, e.g. magnetically coupled shields (G11B5/3916 takes precedence) · CPC title
Manufacture of shielding device · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.