Pattern matching method, apparatus and line width measuring machine

Patent metadata

Field	Value
Publication number	US-8994936-B2
Application number	US-201213806992-A
Country	US
Kind code	B2
Filing date	Nov 27, 2012
Priority date	Nov 22, 2012
Publication date	Mar 31, 2015
Grant date	Mar 31, 2015

Abstract

The present invention discloses a pattern matching method, which is used in measurement process for line width measuring machine, comprising: reading a standard pattern used for matching on the at least one predetermined position of a measured sample; respectively comparing each standard pattern of the measured sample with prestored multiple designed original images corresponding to the standard pattern; determining that the pattern matching is successful if the standard pattern on the measured sample successfully compares with at least one designed original image, and proceeding with the subsequent line width measurement process; otherwise, determining that the pattern matching is failed. The present invention also discloses a corresponding pattern matching method and a line width measuring machine. According to the embodiment of the present invention, it can improve the accuracy and the success rate of the pattern matching when measuring the line width.

First claim

What is claimed is:

1. A pattern matching method of a pattern matching apparatus, which is used in measurement process for line width measuring machine, comprising:
using an image acquisition unit to read a standard pattern used for matching on the at least one predetermined position of a measured sample, and the measured sample being a transparent substrate coated with multiple patterns;
using a matching processing unit to compare each standard pattern of the measured sample wi…

Assignees

• Shenzhen China Star Optoelect
• Shenzhen China Star Optoelect

Inventors

• Lin Yung-Yu

Classifications

• G01N21/956 Primary

  Physics · mapped topic

• G01N21/95607

  Physics · mapped topic