Semiconductor device and method for forming the same
US-2024395669-A1 · Nov 28, 2024 · US
US8994110B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8994110-B2 |
| Application number | US-201314088466-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 25, 2013 |
| Priority date | Nov 28, 2012 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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A semiconductor integrated circuit is provided. In the semiconductor integrated circuit, each of ESD protection circuitries is disposed between two of TSV bumps arrayed in a matrix, the two being arranged adjacent to each other. First main power lines are disposed to overlap P-channel ESD protection elements. Second main power lines are disposed to overlap N-channel ESD protection elements. The first and second main power lines are arranged orthogonally to each other.
Opening claim text (preview).
What is claimed is: 1. A semiconductor integrated circuit, comprising: a plurality of through silicon via (TSV) bumps; a plurality of input/output (I/O) buffers connected to said plurality of TSV bumps, respectively; and first and second main power lines, wherein said plurality of I/O buffers respectively include a plurality of electrostatic discharge (ESD) protection circuitries, wherein each of said ESD protection circuitries includes: a P-channel ESD protection circui…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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