Methods of forming semiconductor devices
US-2024387699-A1 · Nov 21, 2024 · US
US8994086B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8994086-B2 |
| Application number | US-90431310-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 14, 2010 |
| Priority date | Nov 11, 2004 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Official abstract text for this publication.
The invention provides a semiconductor device which is non-volatile, easily manufactured, and can be additionally written. A semiconductor device of the invention includes a plurality of transistors, a conductive layer which functions as a source wiring or a drain wiring of the transistors, and a memory element which overlaps one of the plurality of transistors, and a conductive layer which functions as an antenna. The memory element includes a first conductive layer, an organic compound layer and a phase change layer, and a second conductive layer stacked in this order. The conductive layer which functions as an antenna and a conductive layer which functions as a source wiring or a drain wiring of the plurality of transistors are provided on the same layer.
Opening claim text (preview).
What is claimed is: 1. A semiconductor device comprising: a first element forming layer; a second element forming layer adhered to the first element forming layer by an adhesive layer made of conductive particles dispersed in a resin, wherein the first element forming layer includes: a first transistor and a second transistor; an interlayer insulating layer which covers the first transistor and the second transistor; a first conductive layer functioning as an antenna over…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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