Imaging element and imaging device
US-2024388815-A1 · Nov 21, 2024 · US
US8994083B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8994083-B2 |
| Application number | US-201213541447-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 3, 2012 |
| Priority date | Jul 11, 2001 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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In an X-Y address type solid state image pickup device represented by a CMOS image sensor, a back side light reception type pixel structure is adopted in which a wiring layer is provided on one side of a silicon layer including photo-diodes formed therein. and visible light is taken in from the other side of the silicon layer, namely, from the side (back side) opposite to the wiring layer. wiring can be made without taking a light-receiving surface into account, and the degree of freedom in wiring for the pixels is enhanced.
Opening claim text (preview).
We claim: 1. An imaging device comprising: a semiconductor layer, a first surface of the semiconductor layer being opposite to a second surface of the semiconductor layer; wirings in an insulator layer, said insulator layer touching said first surface; a back side layer of a first conductivity type at said second surface, said back side layer being between a photo-electric conversion region of a second conductivity type and a micro-lens; a photo-diode layer of the first cond…
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