Semiconductor device with heat removal structure and related production method

US8994036B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8994036-B2
Application numberUS-201313864353-A
CountryUS
Kind codeB2
Filing dateApr 17, 2013
Priority dateApr 17, 2012
Publication dateMar 31, 2015
Grant dateMar 31, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

According to the invention, a semiconductor device composite structure is provided which comprises an initial substrate with discrete, integrated devices and a heat removal structure. The heat removal structure comprises: a bond layer which is attached to the initial substrate or the devices, a heat removal structure which is attached on the bond layer and which consists of a material with a specific thermal conductivity which is at least double the level of the average specific heat conductivity of the initial substrate or the devices, and one or more metallic thermal bridges which thermally connect the devices with the heat removal structure via the bond layer. The thermal bridges are designed as vertical through connections (vias) through the bond and heat removal structure. The invention furthermore relates to an associated production method.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor device composite structure which comprises an initial substrate with discrete, integrated device components and a heat removal structure, wherein the heat removal structure comprises: a bond layer which is applied to the initial substrate or to the devices; a heat removal layer which is applied to the bond layer, and consists of a material with at least double the specific heat conductivity of the average specific heat conductivity of the i…

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What does patent US8994036B2 cover?
According to the invention, a semiconductor device composite structure is provided which comprises an initial substrate with discrete, integrated devices and a heat removal structure. The heat removal structure comprises: a bond layer which is attached to the initial substrate or the devices, a heat removal structure which is attached on the bond layer and which consists of a material with a sp…
Who is the assignee on this patent?
Forschungsverbund Berlin Ev
What technology area does this patent fall under?
Primary CPC classification H10W40/22. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).