Laser induced plasma micromachining (lipmm)
US-2016358759-A1 · Dec 8, 2016 · US
Drawing apparatus and method of manufacturing article
US8993985B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993985-B2 |
| Application number | US-201314102545-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 11, 2013 |
| Priority date | Dec 11, 2012 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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- Title
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Abstract
Official abstract text for this publication.
The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, including an aperture array configured to include a plurality of apertures for shaping the respective charged particle beams, a deflection unit configured to include a plurality of first deflectors which are arranged on a side, with respect to the aperture array, of a charged particle source for radiating a charged particle beam and which deflect the respective charged particle beams, and to individually change irradiated positions of the respective charged particle beams on the aperture array by driving the respective first deflectors, and a controller configured to control deflection of the charged particle beams by the first deflectors to reduce a dispersion of intensities of the respective charged particle beams on the substrate.
First claim
Opening claim text (preview).
What is claimed is: 1. A drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, comprising: an aperture array configured to include a plurality of apertures for shaping the respective charged particle beams; a first deflection unit configured to include a plurality of first deflectors which are arranged on a side, with respect to the aperture array, of a charged particle source for radiating a charged particle beam and which deflect t…
Assignees
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Classifications
- H01J37/302Primary
Electricity · mapped topic
- H01J37/147Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent US8993985B2 cover?
- The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, including an aperture array configured to include a plurality of apertures for shaping the respective charged particle beams, a deflection unit configured to include a plurality of first deflectors which are arranged on a side, with respect to the aperture array, …
- Who is the assignee on this patent?
- Canon Kk
- What technology area does this patent fall under?
- Primary CPC classification H01J37/302. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).