Top wafer rotation and support

US8993933B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8993933-B2
Application numberUS-201313749550-A
CountryUS
Kind codeB2
Filing dateJan 24, 2013
Priority dateJan 26, 2012
Publication dateMar 31, 2015
Grant dateMar 31, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Embodiments of the present invention provide thermal processing chambers including a drive mechanism and a heating assembly disposed on opposite sides of a substrate support assembly. Particularly, the heating assembly is disposed below the substrate support assembly to process a substrate with a device side facing up and the drive mechanism is disposed above the substrate assembly.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for thermal processing a substrate, comprising: a chamber body defining a processing volume; a heating assembly disposed under the processing volume, wherein the heating assembly comprises a plurality of radiant heating sources directing radiant energy toward the processing volume; a substrate support assembly operable to position a substrate over the heating assembly in the processing volume; and a drive mechanism operable to rotate the s…

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Frequently asked questions

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What does patent US8993933B2 cover?
Embodiments of the present invention provide thermal processing chambers including a drive mechanism and a heating assembly disposed on opposite sides of a substrate support assembly. Particularly, the heating assembly is disposed below the substrate support assembly to process a substrate with a device side facing up and the drive mechanism is disposed above the substrate assembly.
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/0436. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).