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Compositions comprising reverse micelles and methods for their use
US8993494B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993494-B2 |
| Application number | US-201013144544-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 1, 2010 |
| Priority date | Dec 1, 2010 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Abstract
Official abstract text for this publication.
Compositions containing a reverse micelle comprising a first compound and a second compound are disclosed, wherein the second compound is configured to change conformation in response to a stimulus, a first conformation selected for formation of the reverse micelle, and a second conformation selected for disruption of the reverse micelle; and wherein the first compound is selected to interact with the first conformation of the second compound to form the reverse micelle.
First claim
Opening claim text (preview).
The invention claimed is: 1. A composition comprising a first compound and second compound in an oil wherein: the first compound comprises an organic acid, sodium chloride, hydrogen phthalate, or a substituted or unsubstituted cinnamic acid or a salt or ester thereof; the second compound has a first conformation that forms a reverse micelle interaction with the first compound; the second compound has a second conformation that disrupts or prevents formation of a reverse micell…
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Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
- C10M171/00Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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- What does patent US8993494B2 cover?
- Compositions containing a reverse micelle comprising a first compound and a second compound are disclosed, wherein the second compound is configured to change conformation in response to a stimulus, a first conformation selected for formation of the reverse micelle, and a second conformation selected for disruption of the reverse micelle; and wherein the first compound is selected to interact w…
- Who is the assignee on this patent?
- Kusuura Takahisa, Empire Technology Dev Llc
- What technology area does this patent fall under?
- Primary CPC classification C10M171/00. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).