Plasma processing apparatus
US-2024420923-A1 · Dec 19, 2024 · US
US8993422B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993422-B2 |
| Application number | US-201213670402-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 6, 2012 |
| Priority date | Nov 6, 2012 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Official abstract text for this publication.
In accordance with an embodiment of the present invention, a process tool includes a chuck configured to hold a substrate. The chuck is disposed in a chamber. The process tool further includes a shielding unit with a central opening. The shielding unit is disposed in the chamber over the chuck.
Opening claim text (preview).
What is claimed is: 1. A method of forming a device, the method comprising: placing a first substrate over a chuck of a chamber; positioning a shield between a plasma source and the chuck, the shield covering a first peripheral region of the chuck, wherein the shield includes a central opening exposing a central region of the chuck; adjusting a diameter of the central opening to a first opening size; and after adjusting the diameter of the central opening to the first openin…
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