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Semiconductor device with recess gate and method for fabricating the same
US8993391B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993391-B2 |
| Application number | US-201313844900-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 16, 2013 |
| Priority date | Dec 27, 2012 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Abstract
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A method for fabricating a semiconductor device includes forming a conductive layer over first and second regions of a semiconductor substrate, forming a trench extended in the first region of the semiconductor substrate through the conductive layer, forming a recessed gate electrode in the trench, doping the conductive layer and the recessed first gate electrode, and forming a second gate electrode by etching the doped conductive layer.
First claim
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What is claimed is: 1. A method for fabricating a semiconductor device, comprising: forming a conductive layer over first and second regions of a semiconductor substrate; forming a trench extended in the first region of the semiconductor substrate through the conductive layer; forming a first gate electrode in the trench; doping the conductive layer over the first and second regions and the first gate electrode; forming a second gate electrode in the second region by etchi…
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Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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- What does patent US8993391B2 cover?
- A method for fabricating a semiconductor device includes forming a conductive layer over first and second regions of a semiconductor substrate, forming a trench extended in the first region of the semiconductor substrate through the conductive layer, forming a recessed gate electrode in the trench, doping the conductive layer and the recessed first gate electrode, and forming a second gate elec…
- Who is the assignee on this patent?
- Sk Hynix Inc
- What technology area does this patent fall under?
- Primary CPC classification H10D84/0179. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).