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Multiple patterning process for forming trenches or holes using stitched assist features
US8993224B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993224-B2 |
| Application number | US-201414286285-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 23, 2014 |
| Priority date | Mar 8, 2012 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Abstract
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One illustrative method disclosed herein involves identifying an overall target pattern comprised of at least one hole-type feature, decomposing the overall target pattern into at least a first sub-target pattern and a second sub-target pattern, wherein the first sub-target pattern and the second sub-target pattern each comprise at least one common hole-type feature, generating a first set of mask data information corresponding to the first sub-target pattern, and generating a second set of mask data information corresponding to the second sub-target pattern.
First claim
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What is claimed: 1. A method of imaging an overall target pattern that is comprised of at least first and second sub-target patterns, wherein the first sub-target pattern and the second sub-target pattern each comprise at least one common hole-type feature, the method comprising: performing a first exposure process using a first mask that corresponds to said first sub-target pattern; and performing a second exposure process using a second mask that corresponds to said second sub…
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- What does patent US8993224B2 cover?
- One illustrative method disclosed herein involves identifying an overall target pattern comprised of at least one hole-type feature, decomposing the overall target pattern into at least a first sub-target pattern and a second sub-target pattern, wherein the first sub-target pattern and the second sub-target pattern each comprise at least one common hole-type feature, generating a first set of m…
- Who is the assignee on this patent?
- Globalfoundries Inc
- What technology area does this patent fall under?
- Primary CPC classification G03F1/70. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).