Method for providing a template for a self-assemblable polymer for use in device lithography
US-9182673-B2 · Nov 10, 2015 · US
Pattern forming process
US8993222B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993222-B2 |
| Application number | US-201414156609-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 16, 2014 |
| Priority date | Feb 14, 2013 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Abstract
Official abstract text for this publication.
A pattern is formed by coating a first resist composition comprising a resin comprising recurring units having an acid labile group so that it may turn insoluble in organic solvent upon elimination of the acid labile group, a photoacid generator, and a first organic solvent, onto a processable substrate, prebaking, exposing, PEB, and developing in an organic solvent developer to form a first negative pattern; heating the negative pattern to render it resistant to a second organic solvent used in a second resist composition; coating the second resist composition, prebaking, exposing, PEB, and developing in an organic solvent developer to form a second negative pattern. The first and second negative patterns are simultaneously formed.
First claim
Opening claim text (preview).
The invention claimed is: 1. A pattern forming process comprising the steps of: coating a first chemically amplified resist composition onto a processable substrate, said first resist composition comprising a resin comprising recurring units having 7-oxanorbornane ring and recurring units having an acid labile group which is eliminatable with acid so that it may turn insoluble in an organic solvent developer as a result of the acid labile group being eliminated, a photoacid genera…
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Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
- G03F7/2024Primary
Physics · mapped topic
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- What does patent US8993222B2 cover?
- A pattern is formed by coating a first resist composition comprising a resin comprising recurring units having an acid labile group so that it may turn insoluble in organic solvent upon elimination of the acid labile group, a photoacid generator, and a first organic solvent, onto a processable substrate, prebaking, exposing, PEB, and developing in an organic solvent developer to form a first ne…
- Who is the assignee on this patent?
- Shinetsu Chemical Co
- What technology area does this patent fall under?
- Primary CPC classification G03F7/2024. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).