Sulfonium salt, chemically amplified resist composition, and pattern forming process
US-9221742-B2 · Dec 29, 2015 · US
Salt and photoresist composition containing the same
US8993210B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993210-B2 |
| Application number | US-201113027575-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 15, 2011 |
| Priority date | Feb 18, 2010 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Abstract
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A salt represented by the formula (I): wherein R 1 and R 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X 1 represents a C1-C17 divalent saturated hydrocarbon group which can have one or more fluorine atoms and in which one or more —CH 2 — can be replaced by —O— or —CO—, R 3 represents a group having a cyclic ether structure, and Z 1+ represents an organic cation.
First claim
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What is claimed is: 1. A salt represented by the formula (I): wherein R 1 and R 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X 1 represents a C1-C17 divalent saturated hydrocarbon group which can have one or more fluorine atoms and in which one or more —CH 2 — can be replaced by —O— or —CO—, R 3 represents a structure containing an oxirane…
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Cross-Sectional Technologies · mapped topic
Cross-Sectional Technologies · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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- What does patent US8993210B2 cover?
- A salt represented by the formula (I): wherein R 1 and R 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X 1 represents a C1-C17 divalent saturated hydrocarbon group which can have one or more fluorine atoms and in which one or more —CH 2 — can be replaced by —O— or —CO—, R 3 represents a group having a cyclic ether structure, and Z…
- Who is the assignee on this patent?
- Ichikawa Koji, Sakamoto Hiromu, Sumitomo Chemical Co
- What technology area does this patent fall under?
- Primary CPC classification C07C381/12. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).