Chemically amplified positive resist composition and resist pattern forming process
US-12164231-B2 · Dec 10, 2024 · US
US8993209B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993209-B2 |
| Application number | US-201113810131-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 12, 2011 |
| Priority date | Jul 14, 2010 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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The present invention relates to a positive type photosensitive resin composition and an organic light emitting device black bank comprising the same, and more particularly, an organic light emitting device black bank comprising the photosensitive resin composition according to the exemplary embodiment of the present invention may further have a function of a black matrix without an additional process, such that it is possible to simplify a manufacturing process of the organic light emitting device and largely improve visibility.
Opening claim text (preview).
The invention claimed is: 1. A positive type photosensitive resin composition comprising: 1) a polyimide-based resin that is represented by the following Formula 1, 2) a photoactive compound (PAC) or a photoacid generator (PAG), 3) a black pigment or a black dye, and 4) an organic solvent: wherein, Zs are each independently a tetravalent organic group derived…
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