Apparatus for fabricating materials
US-10150689-B2 · Dec 11, 2018 · US
US8993115B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993115-B2 |
| Application number | US-201013203806-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 16, 2010 |
| Priority date | Dec 28, 2009 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Official abstract text for this publication.
An aspect of the present invention relates to a press-molding glass material, which comprises a core part comprised of optical glass and a silicon oxide film of less than 15 nm in thickness covering at least a portion of the core part, the portion being to be an optically functional surface, as well as has a surface free energy as measured by a three-liquid method of equal to or lower than 75 mJ/m 2 . A further aspect of the present invention relates to a method of manufacturing a press-molding glass material comprising a core part comprised of optical glass and a silicon oxide film covering at least a portion of the core part to be an optically functional surface. The silicon oxide film is less than 15 nm in thickness, and film formation processing is conducted with a film-forming material comprised of SiO 2 in an atmosphere with an oxygen content falling within a range of equal to or higher than 5 volume percent but less than 20 volume percent to form the silicon oxide film on the above portion of the core part.
Opening claim text (preview).
The invention claimed is: 1. A press-molding glass material, which comprises a core part comprised of optical glass and a silicon oxide film of less than 15 nm in thickness covering at least a portion of the core part, the portion being to be an optically functional surface, as well as has a surface free energy that is given by the sum of a nonpolar component and a hydrogen bond component and a dipolar component as measured by a three-liquid method of equal to or lower than 75 mJ/m…
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