Transparent sheet having a pattern for infrared reflection

US8993100B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8993100-B2
Application numberUS-542707-A
CountryUS
Kind codeB2
Filing dateDec 27, 2007
Priority dateDec 27, 2006
Publication dateMar 31, 2015
Grant dateMar 31, 2015

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  5. First independent claim

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Abstract

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An infrared ray reflection pattern-printed transparent sheet is provided which can be applied to a data input system of a type of handwriting directly on a screen of a display device and provides a coordinate detect means and which is lightweight, low in a cost, readily increased in an area, possible in mass production and excellent in a read performance. It is an infrared ray reflection pattern-printed transparent sheet in which infrared ray reflective transparent patterns are printed on a surface of a transparent substrate and which is disposed oppositely to a front face of a display device. A cross section obtained by cutting the infrared ray reflective transparent patterns printed on the above transparent substrate in a face orthogonal to the above transparent substrate is formed so that it assumes a multilayer structure comprising a fixed repeating cycle when observed under a scanning electron microscope.

First claim

Opening claim text (preview).

What is claimed is: 1. An infrared ray reflection pattern-printed transparent sheet in which infrared ray reflective transparent patterns are printed on a surface of a transparent substrate and in which the infrared ray reflection pattern-printed transparent sheet can be disposed oppositely to a front face of a display device capable of displaying images, wherein an ink constituting the infrared ray reflective transparent patterns contains an infrared ray reflection material, and…

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What does patent US8993100B2 cover?
An infrared ray reflection pattern-printed transparent sheet is provided which can be applied to a data input system of a type of handwriting directly on a screen of a display device and provides a coordinate detect means and which is lightweight, low in a cost, readily increased in an area, possible in mass production and excellent in a read performance. It is an infrared ray reflection patter…
Who is the assignee on this patent?
Sekine Keiko, Miyazaki Yuichi, Maenishi Satoko, and 1 more
What technology area does this patent fall under?
Primary CPC classification B32B38/145. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).