Sputtering target of ferromagnetic material with low generation of particles
US-9181617-B2 · Nov 10, 2015 · US
Applying bias voltage during formation of granular recording media
US8993073B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993073-B2 |
| Application number | US-17243808-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 14, 2008 |
| Priority date | Jul 14, 2008 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Abstract
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An embodiment of the invention relates to a perpendicular magnetic recording medium comprising (1) a substrate, (2) an interlayer comprising hexagonal columns and (3) a magnetic layer, wherein the magnetic layer is deposited applying a bias voltage to the substrate such that the magnetic layer comprises magnetic grains having substantially no sub-grains within the magnetic layer, and the magnetic layer has perpendicular magnetic anisotropy.
First claim
Opening claim text (preview).
The invention claimed is: 1. A method, comprising: applying a bias voltage on a substrate; depositing on the substrate an interlayer, wherein the interlayer comprises Ru; depositing a granular magnetic layer on the interlayer while applying the bias voltage and pressure, wherein the magnetic layer has perpendicular magnetic anisotropy and comprises: magnetic grains comprising Co, Pt, and at least one of Mo and Cr, and a non-magnetic grain boundary phase between the magneti…
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Physics · mapped topic
Physics · mapped topic
- G11B5/851Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US8993073B2 cover?
- An embodiment of the invention relates to a perpendicular magnetic recording medium comprising (1) a substrate, (2) an interlayer comprising hexagonal columns and (3) a magnetic layer, wherein the magnetic layer is deposited applying a bias voltage to the substrate such that the magnetic layer comprises magnetic grains having substantially no sub-grains within the magnetic layer, and the magnet…
- Who is the assignee on this patent?
- Xu Weilu, Lu Miaogen, Munteanu Mariana R, and 5 more
- What technology area does this patent fall under?
- Primary CPC classification G11B5/851. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).