Chemistry compatible coating material for advanced device on-wafer particle performance
US-2016211121-A1 · Jul 21, 2016 · US
US8992852B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8992852-B2 |
| Application number | US-201013203125-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 24, 2010 |
| Priority date | Feb 24, 2009 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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A device including a first part having a substrate made of a material based on a silicon compound, a coating made of a coating material having a ceramic oxide, a transition layer having silica extending between the substrate and the coating, the transition layer exhibiting a thickness of less than 10 μm, and a first shrink ring and/or a layer made of a compliant material having an alloy with at least two materials selected from silver, gold and palladium, the coating defining at least a portion of the interface between the first part, and the first shrink ring and/or the layer made of a compliant material.
Opening claim text (preview).
The invention claimed is: 1. A device comprising: a first part comprising a substrate made of a material based on a silicon compound, a coating made of a coating material comprising a ceramic oxide, a transition layer comprising silica extending between the substrate and the coating, said transition layer exhibiting a thickness of less than 10 μm, and a first shrink ring and/or a layer made of a compliant material composed of an alloy comprising at least two materials select…
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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