Apparatus for preparing silicon nanoparticle using ICP

Patent metadata

Field	Value
Publication number	US-8992849-B2
Application number	US-201314068797-A
Country	US
Kind code	B2
Filing date	Oct 31, 2013
Priority date	Apr 4, 2013
Publication date	Mar 31, 2015
Grant date	Mar 31, 2015

Abstract

Disclosed is an apparatus for preparing silicon nanoparticles. The apparatus includes a corona discharge section charging silicon nanoparticles to exhibit unipolarity in order to prevent agglomeration of the silicon nanoparticles after the silicon nanoparticles are generated from an injected gas by plasma reaction of an inductively coupled plasma (ICP) coil. The apparatus may facilitate grain size control of silicon nanoparticles while improving discharge performance of a mesh filter for collection of generated nanoparticles by preventing agglomeration of the silicon nanoparticles generated by plasma reaction using inductively coupled plasma (ICP), and may permit replacement of the mesh filter even during operation of the apparatus, thereby improving productivity while reducing manufacturing costs.

First claim

What is claimed is:

1. An apparatus for preparing silicon nanoparticles, comprising:
a first gas injection path configured to inject a first gas for generating silicon nanoparticles;
a second gas injection path configured to inject a second gas for doping the silicon nanoparticles;
a plasma reaction section connected with the first and second gas injection paths, and configured to generate and dope the silicon nanoparticles by using the injected gases;
an inductively coupled…

Assignees

• Korea Energy Research Inst

Inventors

• Jang Bo-Yun
• Kim Joon-Soo
• Lee Jin-Seok

Classifications

• B01J19/08 Primary

  Operations & Transport · mapped topic

• B01J2219/0894

  Operations & Transport · mapped topic

• B01J2219/0849

  Operations & Transport · mapped topic

• B01J2208/00681

  Operations & Transport · mapped topic

• B01J19/088 Primary

  Operations & Transport · mapped topic