Antireflective coatings for via fill and photolithography applications and methods of preparation thereof

Patent metadata

Field	Value
Publication number	US-8992806-B2
Application number	US-201113217706-A
Country	US
Kind code	B2
Filing date	Aug 25, 2011
Priority date	Nov 18, 2003
Publication date	Mar 31, 2015
Grant date	Mar 31, 2015

Abstract

An absorbing composition is described herein that includes at least one inorganic-based compound, at least one absorbing compound, and at least one material modification agent. In addition, methods of making an absorbing composition are also described that includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, an acid/water mixture, and one or more solvents to form a reaction mixture; and b) allowing the reaction mixture to form the absorbing composition at room temperature. Another method of making an absorbing composition includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, an acid/water mixture, and one or more solvents to form a reaction mixture; and b) heating the reaction mixture to form the absorbing composition. Yet another method of making an absorbing composition is described that includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, and one or more solvents to form a reaction mixture, wherein the at least one material modification agent comprises at least one acid and water; and b) heating the reaction mixture to form an absorbing material, a coating or a film. In other methods of making an absorbing composition described herein, those methods include: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, and one or more solvents to form a reaction mixture, wherein the at least one material modification agent comprises at least one acid and water; and b) allowing the reaction mixture to form an absorbing material, a coating or a film.

First claim

We claim:

1. An absorbing composition formed from a reaction mixture comprising:
at least one inorganic compound;
at least one light absorbing compound, wherein the at least one light absorbing compound comprises anthraflavic acid, 9-anthracene carboxylic acid, 9-anthracene methanol, alizarin, quinizarin, primuline, 2-hydroxy-4(3-triethoxysilylpropoxy)-diphenylketone, rosolic acid, triethoxysilylpropyl-1,8-naphthalimide, 9-anthracene carboxy-alkyl triethoxysilane, phenyltriethox…

Assignees

• Li Bo
• Kennedy Joseph
• Iwamoto Nancy
• Fradkin Mark A
• Hussein Makarem A
• Goodner Michael D
• Lu Victor
• Leung Roger
• Honeywell Int Inc

Inventors

• Li Bo
• Kennedy Joseph
• Iwamoto Nancy
• Fradkin Mark A
• Hussein Makarem A
• Goodner Michael D
• Lu Victor
• Leung Roger

Classifications

• G03F7/091

  Physics · mapped topic

• G03F7/0751

  Physics · mapped topic

• G03F7/0752

  Physics · mapped topic

• C09D183/04 Primary

  Chemistry & Metallurgy · mapped topic

• C09D183/08

  Chemistry & Metallurgy · mapped topic