Plasma reactor with inductie excitation of plasma and efficient removal of heat from the excitation coil

Patent metadata

Field	Value
Publication number	US-8992725-B2
Application number	US-89483207-A
Country	US
Kind code	B2
Filing date	Aug 23, 2007
Priority date	Aug 28, 2006
Publication date	Mar 31, 2015
Grant date	Mar 31, 2015

Abstract

The plasma reactor of the invention is intended for treating the surfaces of objects such as semiconductor wafers and large display panels, or the like, with plasma. The main part of the plasma reactor is an array of RF antenna cells, which are deeply immersed into the interior of the working chamber. Each antenna cell has a ferromagnetic core with a heat conductor and a coil wound onto the core. The core and coil are sealed in the protective cap. Deep immersion of the antenna cells having the structure of the invention provides high efficiency of plasma excitation, while the arrangement of the plasma cells and possibility of their individual adjustment provide high uniformity of plasma distribution and possibility of adjusting plasma parameters, such as plasma density, in a wide range.

First claim

The invention claimed is:

1. A plasma reactor with inductive excitation of plasma, comprising:
a working chamber that can be sealed and evacuated and that is provided with working gas supply channels, and a working gas outlet port, the working chamber comprising a sidewall and a chamber top;
a plurality of antenna cells immersed into the working chamber; and
an RF power source connected to the antenna cells for generation of plasma in the working chamber;
each antenna cell o…

Assignees

• Godyak Valery
• Mattson Tech Inc

Inventors

• Godyak Valery

Classifications

• H01J2237/334

  Electricity · mapped topic

• H01J2237/332

  Electricity · mapped topic

• H01J2237/338

  Electricity · mapped topic

• H01J37/32458

  Electricity · mapped topic

• H01J37/3211 Primary

  Electricity · mapped topic