Liquid discharge head, liquid discharge device, and liquid discharge apparatus
US-2015375505-A1 · Dec 31, 2015 · US
Method of manufacturing a liquid jet head and a liquid jet apparatus
US8991985B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8991985-B2 |
| Application number | US-201314084543-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 19, 2013 |
| Priority date | Feb 25, 2008 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Abstract
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A method of manufacturing a liquid jet head includes depositing a lower electrode film on a passage forming substrate and patterning the lower electrode film into a predetermined pattern, forming a piezoelectric layer on the passage forming substrate, forming an intermediate film made of a conductive material on the piezoelectric layer, forming a protective film on the intermediate film and, using the protective film as a mask, patterning by etching the piezoelectric layer together with the intermediate film into a predetermined pattern, peeling off the protective film, and depositing an upper electrode film on the passage forming substrate and patterning the upper electrode film into a predetermined pattern.
First claim
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What is claimed is: 1. A method of manufacturing a liquid jet head, the liquid jet head comprising a pressure generating chamber in a substrate, the method comprising: forming a lower electrode layer in a region corresponding to the pressure generating chamber; forming a piezoelectric layer so as to cover the lower electrode layer; forming an intermediate layer made of a conductive material on the piezoelectric layer; forming a protective layer on the intermediate layer an…
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Frequently asked questions
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- What does patent US8991985B2 cover?
- A method of manufacturing a liquid jet head includes depositing a lower electrode film on a passage forming substrate and patterning the lower electrode film into a predetermined pattern, forming a piezoelectric layer on the passage forming substrate, forming an intermediate film made of a conductive material on the piezoelectric layer, forming a protective film on the intermediate film and, us…
- Who is the assignee on this patent?
- Seiko Epson Corp
- What technology area does this patent fall under?
- Primary CPC classification B41J2/055. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).