Exposure apparatus, calibration method, and method of manufacturing article

Patent metadata

Field	Value
Publication number	US-8988656-B2
Application number	US-201313940313-A
Country	US
Kind code	B2
Filing date	Jul 12, 2013
Priority date	Jul 13, 2012
Publication date	Mar 24, 2015
Grant date	Mar 24, 2015

Abstract

The present invention provides an exposure apparatus which exposes a substrate to light, the apparatus comprising a substrate stage, a position measurement unit configured to measure a position of the substrate stage, a structure configured to support the position measurement unit, a force measurement unit configured to measure a force that acts on the structure, a correction unit configured to correct a command for controlling the position of the substrate stage, based on the measurement value obtained by the force measurement unit, and a correction coefficient, and a calculation unit configured to calculate the correction coefficient based on position deviation information between adjacent shot regions in an evaluation substrate including a plurality of shot regions exposed without correction by the correction unit, and the measurement value obtained by the force measurement unit in exposing each shot region.

First claim

What is claimed is:

1. An exposure apparatus which exposes a substrate to light, the apparatus comprising:
a substrate stage configured to be movable upon holding the substrate;
a position measurement unit configured to measure a position of the substrate stage;
a structure configured to support the position measurement unit;
a force measurement unit configured to measure a force that acts on the structure;
a correction unit configured to correct a command for controlling…

Assignees

• Canon Kk

Inventors

• Harayama Tomohiro
• Nagatani Dai
• Yoshida Kouji
• Ozawa Yuichi

Classifications

• G03F7/70258

  Physics · mapped topic

• G03F7/70775 Primary

  Physics · mapped topic

• H10P72/50

  Electricity · mapped topic

• H10P76/2041 Primary

  Electricity · mapped topic