Electron gun, X-ray generation apparatus, and X-ray imaging apparatus
US-10971322-B2 · Apr 6, 2021 · US
Enhanced integrity projection lens assembly
US8987679B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8987679-B2 |
| Application number | US-201213722873-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 20, 2012 |
| Priority date | Oct 9, 2009 |
| Publication date | Mar 24, 2015 |
| Grant date | Mar 24, 2015 |
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Abstract
Official abstract text for this publication.
The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.
First claim
Opening claim text (preview).
The invention claimed is: 1. Projection lens assembly for a directing a multitude of charged particle beamlets onto an image plane, said projection lens assembly comprising a beam stop array comprising an array of apertures, for blocking charged particle beamlets provided with a blanking deflection by a beam blanker and letting through charged particle beamlets not provided with a blanking deflection by said beam blanker, at least one support element comprising a through-opening fo…
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Classifications
- H01J3/18Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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- What does patent US8987679B2 cover?
- The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its…
- Who is the assignee on this patent?
- Mapper Lithography Ip Bv
- What technology area does this patent fall under?
- Primary CPC classification H01J3/18. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Mar 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).