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Fabricate self-formed nanometer pore array at wafer scale for DNA sequencing
US8986980B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8986980-B2 |
| Application number | US-201213469220-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 11, 2012 |
| Priority date | May 11, 2012 |
| Publication date | Mar 24, 2015 |
| Grant date | Mar 24, 2015 |
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- Title
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Abstract
Official abstract text for this publication.
A technique is provided for a structure. A substrate has a nanopillar vertically positioned on the substrate. A bottom layer is formed beneath the substrate. A top layer is formed on top of the substrate and on top of the nanopillar, and a cover layer covers the top layer and the nanopillar. A window is formed through the bottom layer and formed through the substrate, and the window ends at the top layer. A nanopore is formed through the top layer by removing the cover layer and the nanopillar.
First claim
Opening claim text (preview).
What is claimed is: 1. A structure, comprising: a substrate having a top layer and a bottom layer; a hole formed through the top layer, wherein the hole is coated with a coating to capture a carbon nanotube in the hole, the carbon nanotube being captured to be positioned in the hole; a window formed through the bottom layer and formed through the substrate wherein the window ends at the top layer; a cover layer covers the top layer and the carbon nanotube positioned in the h…
Assignees
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Classifications
Operations & Transport · mapped topic
Cross-Sectional Technologies · mapped topic
Cross-Sectional Technologies · mapped topic
- B82Y40/00Primary
Operations & Transport · mapped topic
Cross-Sectional Technologies · mapped topic
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Frequently asked questions
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- What does patent US8986980B2 cover?
- A technique is provided for a structure. A substrate has a nanopillar vertically positioned on the substrate. A bottom layer is formed beneath the substrate. A top layer is formed on top of the substrate and on top of the nanopillar, and a cover layer covers the top layer and the nanopillar. A window is formed through the bottom layer and formed through the substrate, and the window ends at the…
- Who is the assignee on this patent?
- Stolovitzky Gustavo A, Wang Deqiang, IBM
- What technology area does this patent fall under?
- Primary CPC classification B82Y40/00. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Mar 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).