Imprinting device, method of fabricating the same, and method of patterning thin film using the same

Patent metadata

Field	Value
Publication number	US-8986909-B2
Application number	US-3095908-A
Country	US
Kind code	B2
Filing date	Feb 14, 2008
Priority date	Jun 5, 2007
Publication date	Mar 24, 2015
Grant date	Mar 24, 2015

Abstract

An imprinting device includes a first substrate, a light blocking layer formed on the first substrate corresponding to a light blocking area, and a patterned layer formed on the first substrate. The patterned layer includes an etch pattern and a flow control pattern formed on the first substrate corresponding to a transmittance area and the light blocking area, respectively. When the patterned layer presses a resin layer, the resin layer pressed by the etch pattern moves towards the flow control pattern or a photosensitive resin layer pressed by the flow control pattern moves towards the etch pattern according to a shape of the flow control pattern. Thus, when the shape of the flow control pattern is controlled, the resin layer pressed by the patterned layer may be formed with a uniform thickness.

First claim

What is claimed is:

1. An imprinting device comprising:
a first substrate including a transmittance area through which a light is transmitted and at least one light blocking area blocking the light;
a light blocking layer having at least one alignment key formed by partially removing a portion therefrom and being formed on the first substrate corresponding to the at least one light blocking area, the light blocking layer disposed on the first substrate corresponding to between t…

Assignees

• Bae Jung-Mok
• Samsung Display Co Ltd

Inventors

• Bae Jung-Mok

Classifications

• B82Y40/00

  Operations & Transport · mapped topic

• B82Y10/00

  Operations & Transport · mapped topic

• G03F7/0002 Primary

  Physics · mapped topic

• H10P76/2041 Primary

  Electricity · mapped topic