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Point of use valve manifold for semiconductor fabrication equipment
US8985152B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8985152-B2 |
| Application number | US-201213626717-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 25, 2012 |
| Priority date | Jun 15, 2012 |
| Publication date | Mar 24, 2015 |
| Grant date | Mar 24, 2015 |
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- Title
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Abstract
Official abstract text for this publication.
A point-of-use valve (POU valve) manifold is provided that allows for multiple precursors to be delivered to a semiconductor processing chamber through a common outlet. The manifold may have a plurality of precursor inlets and a purge gas inlet. The manifold may be configured such that there are zero dead legs in the manifold when the purge gas is routed through the manifold, and may provide mounting location for the POU valves that alternate sides. One or more internal flow path volumes may include elbow features.
First claim
Opening claim text (preview).
What is claimed is: 1. A valve manifold for use in a semiconductor processing tool, comprising: a manifold body; a purge gas inlet; a manifold outlet, the manifold outlet located on a first side of the manifold body; a first valve interface, the first valve interface located on a second side of the manifold body different from the first side; and a second valve interface, the second valve interface located on a third side of the manifold body different from the first side…
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Classifications
Mechanical Engineering · mapped topic
Chemistry & Metallurgy · mapped topic
- C23C16/45544Primary
Chemistry & Metallurgy · mapped topic
Cross-Sectional Technologies · mapped topic
Cross-Sectional Technologies · mapped topic
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Frequently asked questions
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- What does patent US8985152B2 cover?
- A point-of-use valve (POU valve) manifold is provided that allows for multiple precursors to be delivered to a semiconductor processing chamber through a common outlet. The manifold may have a plurality of precursor inlets and a purge gas inlet. The manifold may be configured such that there are zero dead legs in the manifold when the purge gas is routed through the manifold, and may provide mo…
- Who is the assignee on this patent?
- Chandrasekharan Ramesh, Xia Chunguang, Leeser Karl F, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification C23C16/45544. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).