Fabrication of Tetherable Patterned Thin Film with 3D Rolled-up Structure
US-2016246176-A1 · Aug 25, 2016 · US
Stereolithography resin compositions and three-dimensional objects made therefrom
US8980971B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8980971-B2 |
| Application number | US-201313898801-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 21, 2013 |
| Priority date | Mar 20, 2007 |
| Publication date | Mar 17, 2015 |
| Grant date | Mar 17, 2015 |
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Abstract
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A photocurable resin composition for three-dimensional photofabrication operations, including stereolithography, comprising (A) a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups, (B) a cationically polymerizable compound other than the component (A), (C) a cationic photoinitiator, (D) a radically polymerizable compound, (E) a radical photoinitiator, and (F) multilayer polymer particles having a core and a shell layer, the shell layer containing functional group-modified rubber polymer particles having at least one reactive functional group.
First claim
Opening claim text (preview).
The invention claimed is: 1. A photocurable resin composition for three-dimensional photofabrication comprising: (A) from about 3 to about 40% by mass of a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups; (B) from about 20 to about 85% by mass of a cationically polymerizable compound other than the component (A); (C) from about 0.1 to about 10% by mass of a cationic photoinitiator; (D) from about 3 to about 45% by m…
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Operations & Transport · mapped topic
Physics · mapped topic
Physics · mapped topic
- G03F7/0037Primary
Physics · mapped topic
Cross-Sectional Technologies · mapped topic
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- What does patent US8980971B2 cover?
- A photocurable resin composition for three-dimensional photofabrication operations, including stereolithography, comprising (A) a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups, (B) a cationically polymerizable compound other than the component (A), (C) a cationic photoinitiator, (D) a radically polymerizable compound, (E) a radical p…
- Who is the assignee on this patent?
- Dsm Ip Assets Bv, Jsr Corp, Japan Fine Coatings Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0037. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 17 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).