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Photosensitive resin composition, method for producing structure, and liquid discharge head
US8980968B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8980968-B2 |
| Application number | US-201113576895-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 1, 2011 |
| Priority date | Feb 5, 2010 |
| Publication date | Mar 17, 2015 |
| Grant date | Mar 17, 2015 |
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Abstract
Official abstract text for this publication.
A photosensitive resin composition includes (a) a compound polymerizable in the presence of an acid, and (b) a photoacid generating agent including an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below, wherein the component (b) absorbs 50% or more of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition,
First claim
Opening claim text (preview).
The invention claimed is: 1. A photosensitive resin composition comprising: (a) a compound polymerizable in the presence of an acid; (b) a photoacid generating agent comprising an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below; and (c) a compound capable of deactivating an acid produced from the component (b) after exposure to light, wherein the component (b) absorbs at least 50% o…
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Physics · mapped topic
Physics · mapped topic
- B41J2/1603Primary
Operations & Transport · mapped topic
Operations & Transport · mapped topic
Chemistry & Metallurgy · mapped topic
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- What does patent US8980968B2 cover?
- A photosensitive resin composition includes (a) a compound polymerizable in the presence of an acid, and (b) a photoacid generating agent including an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below, wherein the component (b) absorbs 50% or more of the amount of 365 nm wavelength light absorbed by the …
- Who is the assignee on this patent?
- Takahashi Hyo, Ikegame Ken, Shimomura Masako, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification B41J2/1603. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Mar 17 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).