Selective deposition of metal oxide
US-2024282572-A1 · Aug 22, 2024 · US
Combinatorial plasma enhanced deposition techniques
US8980765B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8980765-B2 |
| Application number | US-201213656483-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 19, 2012 |
| Priority date | May 2, 2008 |
| Publication date | Mar 17, 2015 |
| Grant date | Mar 17, 2015 |
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Abstract
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Combinatorial plasma enhanced deposition techniques are described, including designating multiple regions of a substrate, providing a precursor to at least a first region of the multiple regions, and providing a plasma to the first region to deposit a first material on the first region formed using the first precursor, wherein the first material is different from a second material formed on a second region of the substrate.
First claim
Opening claim text (preview).
What is claimed: 1. A system for combinatorial processing of a plurality of discrete regions on a substrate comprising a chamber with a controlled atmosphere, a gas delivery system operable to deliver a first precursor gas to a first discrete region on a substrate, and a plasma generator operable to selectively expose the first discrete region to a plasma; wherein the first precursor gas and the plasma can interact to deposit a first material on the first discrete region, an…
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- C23C16/04Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
- C23C16/45536Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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- What does patent US8980765B2 cover?
- Combinatorial plasma enhanced deposition techniques are described, including designating multiple regions of a substrate, providing a precursor to at least a first region of the multiple regions, and providing a plasma to the first region to deposit a first material on the first region formed using the first precursor, wherein the first material is different from a second material formed on a s…
- Who is the assignee on this patent?
- Intermolecular Inc
- What technology area does this patent fall under?
- Primary CPC classification C23C16/04. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 17 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).