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Methods and systems of material removal and pattern transfer
US8980751B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8980751-B2 |
| Application number | US-201113014508-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 26, 2011 |
| Priority date | Jan 27, 2010 |
| Publication date | Mar 17, 2015 |
| Grant date | Mar 17, 2015 |
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Abstract
Official abstract text for this publication.
Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for removing solidified polymerizable material on a substrate, comprising the steps of: (a) forming a patterned layer, said patterned layer having pattern features and a residual layer on a at least portion of the substrate; (b) providing a vacuum ultraviolet (VUV) radiation source; (c) positioning said substrate such that said portion of said substrate having a residual layer is in alignment with said vacuum ultraviolet (VUV) radiation source;…
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Physics · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
- G03F7/0002Primary
Physics · mapped topic
- G03F7/0022Primary
Physics · mapped topic
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Frequently asked questions
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- What does patent US8980751B2 cover?
- Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.
- Who is the assignee on this patent?
- Schmid Gerard M, Miller Michael N, Choi Byung-Jin, and 6 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0002. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 17 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).