Crosslinkable fluoropolymers
US-2016369028-A1 · Dec 22, 2016 · US
Composition for imprints, pattern and patterning method
US8980404B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8980404-B2 |
| Application number | US-200913122510-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 29, 2009 |
| Priority date | Oct 29, 2008 |
| Publication date | Mar 17, 2015 |
| Grant date | Mar 17, 2015 |
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Abstract
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A composition for imprints comprising a polymerizable monomer, a photopolymerization initiator, and a polymer having a functional group with at least one of a fluorine atom or a silicon atom and having a polymerizable functional group, wherein the polymer has a weight-average molecular weight of at least 2000 and the amount of the polymer is from 0.01 to 20% by mass relative to the polymerizable monomer, is excellent in patternability and mold releasability, capable of forming good patterns and free from a problem of mold contamination.
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The invention claimed is: 1. A composition for imprints comprising: a polymerizable monomer, a photopolymerization initiator, and a polymer having a functional group with at least one of a fluorine atom and a silicon atom and having a polymerizable functional group, wherein the polymer has a weight-average molecular weight of at least 2000 and the amount of the polymer is from 0.01 to 20% by mass relative to the total amount of the polymerizable monomer, wherein the composit…
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Cross-Sectional Technologies · mapped topic
Physics · mapped topic
Physics · mapped topic
Operations & Transport · mapped topic
Chemistry & Metallurgy · mapped topic
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- What does patent US8980404B2 cover?
- A composition for imprints comprising a polymerizable monomer, a photopolymerization initiator, and a polymer having a functional group with at least one of a fluorine atom or a silicon atom and having a polymerizable functional group, wherein the polymer has a weight-average molecular weight of at least 2000 and the amount of the polymer is from 0.01 to 20% by mass relative to the polymerizabl…
- Who is the assignee on this patent?
- Kodama Kunihiko, Fujifilm Corp
- What technology area does this patent fall under?
- Primary CPC classification C08F259/08. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 17 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).