Semiconductor devices having a seal ring
US-2024413245-A1 · Dec 12, 2024 · US
Method of optical proximity correction for modifying line patterns and integrated circuits with line patterns modified by the same
US8977988B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8977988-B2 |
| Application number | US-201313859718-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 9, 2013 |
| Priority date | Apr 9, 2013 |
| Publication date | Mar 10, 2015 |
| Grant date | Mar 10, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
A method of optical proximity correction executed by a computer system and integrated circuit layout formed by the same, the step of optical proximity correction comprises: providing an integrated circuit layout with a plurality of parallel line patterns, wherein one side of at least one line pattern is provided with a convex portion; and modifying the integrated circuit layout by forming a concave portion corresponding to the convex portion at the other side of the line pattern.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of optical proximity correction executed by a computer system, comprising the steps of: providing an integrated circuit layout with a plurality of parallel line patterns and a plurality of interconnect patterns disposed corresponding to said parallel line patterns, wherein one side of each one of said parallel line patterns has a convex portion so that said convex portion overlaps a corresponding one of said interconnect patterns; and using the co…
Assignees
Inventors
Classifications
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US8977988B2 cover?
- A method of optical proximity correction executed by a computer system and integrated circuit layout formed by the same, the step of optical proximity correction comprises: providing an integrated circuit layout with a plurality of parallel line patterns, wherein one side of at least one line pattern is provided with a convex portion; and modifying the integrated circuit layout by forming a con…
- Who is the assignee on this patent?
- United Microelectronics Corp
- What technology area does this patent fall under?
- Primary CPC classification H10W20/43. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Mar 10 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).