Method of measuring mark position and measuring apparatus

Patent metadata

Field	Value
Publication number	US-8976337-B2
Application number	US-201113210003-A
Country	US
Kind code	B2
Filing date	Aug 15, 2011
Priority date	Aug 24, 2010
Publication date	Mar 10, 2015
Grant date	Mar 10, 2015

Abstract

A method and an apparatus are provided to measure a position of a mark with a less measurement error caused by a variation in a wafer process condition. The mark is illuminated with light and an image of the mark is formed, via an optical system, in a light receiving surface of a sensor. The image of the mark is sensed and image data thereof is acquired by the sensor. Correction data of a fundamental frequency and a high harmonic of the image data is set based on information associated with a shape of the mark, an imaging magnification of the optical system, and an imaging area of the sensor. The image data is corrected using the correction data, and the position of the mark is calculated using the corrected image data.

First claim

What is claimed is:

1. A method comprising:
acquiring data of an image of a mark formed on a substrate by sensing the image of the mark by a sensor and an imaging optical system;
setting correction data of a fundamental frequency and a high harmonic of the acquired data based on information associated with a shape of the mark, an imaging magnification of the imaging optical system, and an imaging area of the sensor;
correcting the acquired data based on the correction data; an…

Assignees

• Oishi Satoru
• Canon Kk

Inventors

• Oishi Satoru

Classifications

• G03F9/7092 Primary

  Physics · mapped topic

• G03B27/53

  Physics · mapped topic

• G03B27/521

  Physics · mapped topic